| 摘要 |
An apparatus for processing a substrate is provided to simplify the apparatus for processing the substrate by supplying carrier gas and dilution gas from a gas supplying source. An apparatus(1) for processing a substrate includes a processing chamber(10), a processing gas supplying unit, a picking unit, a dilution gas supplying unit, a diluting unit, a densitometer(73), a first flowmeter(66), a second flowmeter(67), and a calculating unit. The substrate is received inside the processing chamber(10). The processing gas supplying unit supplies carrier gas and processing gas to the processing chamber(10). The picking unit picks a part of the gas inside the processing chamber(10) as sample gas. The dilution gas supplying unit supplies dilution gas to dilute the sample gas. The diluting unit dilutes the sample gas by mixing the dilution gas supplied by the dilution gas supplying unit with the sample gas picked by the picking unit. The densitometer(73) measures the concentration of the processing gas included among the sample gas diluted by the diluting unit. The first flowmeter(66) measures the flux of the sample gas flowing a pipe of the diluting unit after diluting the sample gas. The second flowmeter(67) measures the flux of the dilution gas flowing a pipe of the diluting unit on the dilution gas supplying unit. The calculating unit calculates the concentration of the processing gas included in the sample gas before dilution.
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