| 摘要 |
PROBLEM TO BE SOLVED: To provide an appearance inspecting apparatus having the function of detecting an uneven defect and the function of detecting a pattern defect (minute defect) in a color filter or the like, from image data acquired by photographing a substrate such as the color filter or the like having a pattern shape by using an optics and a photographing system with high resolutions. SOLUTION: The appearance inspecting apparatus comprises a photographing means 10 for photographing the original image of an object to be inspected such as the color filter or the like having a periodic pattern, a light projecting means 20 for projecting uniform light to the object to be inspected, a minute defect inspecting section 30 for determining a pattern abnormality, and an uneven defect inspecting section 40 for detecting an uneven stripe being horizontal or vertical to the object to be inspected. COPYRIGHT: (C)2008,JPO&INPIT
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