| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an oxygen blocking film capable of suppressing contamination of a photomask and an exposure unit with hydrogen chloride, and to provide a substrate, a pattern forming method, and a color filter manufacturing method. <P>SOLUTION: An oxygen blocking film having: a water soluble resin; and a basic compound bonded to hydrogen chloride to form a water soluble compound is used. Further, an oxygen blocking film having: the water soluble resin; and a compound expressed by formula (a), is used. In formula (1), R1 is a C1-8 alkyl group which may have a substituent; R2 and R3 are a C1-8 alkyl group or hydrogen which may have a substituent, and R1, R2 and R3 may be the same or different. <P>COPYRIGHT: (C)2008,JPO&INPIT |
