| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an arc ion plating method capable of obtaining a uniform film thickness distribution substantially over the entire length of a work to be processed, enhancing the yield of a target material, and reducing the target manufacturing cost, and its target. <P>SOLUTION: In the arc ion plating method for depositing a coating film by leading target substance ions to a work 2 by the vacuum arc discharge with the target 3 as a cathode, the dimensions of the sectional shape of the target 3 in the direction orthogonal to the longitudinal direction of the target in a non-used state are the same over the entire length of the target, and the target is divided into ends 31, 32 in the longitudinal direction, and a remaining center portion 33. By controlling the arc spot position, the consumption rate of the ends 31, 32 in the longitudinal direction is higher than that of the center portion 33, and a coating film is deposited on the work 2. In this condition, before the center portion 33 reaches a consumption limit, only both ends 31, 32 in the longitudinal direction with higher consumption rate are changed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
