| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a drive system for a substrate support of the lithographic apparatus or the support of a patterning device, which is compact and requires no thermal conditioning. <P>SOLUTION: A component 11 is moved relative to a reference within a lithographic apparatus by a first actuator 12. A second actuator 15 that exerts force between the component 11 and a reaction mass 13 is used to adjust at least one from among the position, velocity, and acceleration of the component 11, relative to the reference within the lithographic apparatus. <P>COPYRIGHT: (C)2008,JPO&INPIT |
