| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electron-beam drawing device that enables to obtain high throughput with simple control, an electron-beam drawing method, and a semiconductor device manufacturing method. <P>SOLUTION: The electron-beam drawing device includes a plurality of micro-emitter electron guns 20 arranged into a half-array shape, a plurality of charge accumulators 10 respectively connected to each of the micro-emitter electron guns, a charge writing circuit capable of writing charges into the charge accumulators, and an electron optical system for emitting electron beams emitted from the micro-emitter electron guns to a body to be processed. The charge writing circuit accumulates charges into the charge accumulators corresponding to an electronic-beam pattern to be drawn. The electronic-beam pattern is emitted to a body to be irradiated by collectively emitting the electronic beams corresponding to a charge amount accumulated in each of the charge accumulators from the micro-emitter electron guns respectively connected to each of the charge accumulators. <P>COPYRIGHT: (C)2008,JPO&INPIT |
