发明名称 NEGATIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative photosensitive planographic printing plate having high sensitivity to near IR rays at 700 nm or more, excellent elution property and plate wear, and excellent storage property with little decrease in the elution property with time or little change in the sensitivity. <P>SOLUTION: The planographic printing plate has a photopolymerizable photosensitive layer containing a sensitized dye which imparts sensitivity in a wavelength region from 700 nm to 900 nm and an organic boron compound as a radical generating agent, wherein the photosensitive layer contains a thiourea compound expressed by general formula (I). In formula (I), each of R<SB>1</SB>to R<SB>4</SB>represents a hydrogen atom or an unsubstituted alkyl group, wherein R<SB>1</SB>to R<SB>4</SB>may be identical or different from one another and R<SB>2</SB>and R<SB>4</SB>may form a five-member or six-member ring. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007256579(A) 申请公布日期 2007.10.04
申请号 JP20060080348 申请日期 2006.03.23
申请人 MITSUBISHI PAPER MILLS LTD 发明人 SAIKAWA MASAHIKO
分类号 G03F7/004;G03F7/00;G03F7/029 主分类号 G03F7/004
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