Photoresist top coat out-of-band illumination filter for photolithography

摘要

An out-of-band illumination filter for use in photolithography in the form of a top coat on a photoresist is described. The top coat may used by applying a photoresist to a substrate, applying a top coat to the photoresist to prevent out-of-band illumination from exposing the photoresist, and exposing the photoresist in a lithography tool.