发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor device includes a semiconductor substrate which has an integrated circuit formed on a front surface thereof, and a rough surface with a height difference of 1 to 5 mum on a rear surface thereof. A protective film is provided on the rear surface of the semiconductor substrate.
申请公布号 KR100763079(B1) 申请公布日期 2007.10.04
申请号 KR20060016111 申请日期 2006.02.20
申请人 发明人
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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