| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method in which uniform patterning can be performed, and a manufacturing method for a color filter. <P>SOLUTION: The pattern forming method includes a stage of forming an oxygen blocking film 120 on a photosensitive resin film 110, a stage of exposing the photosensitive resin film 110 where the oxygen blocking film 120 is formed to a light pattern, and a stage of developing the exposed photosensitive resin film 110, wherein the oxygen blocking film is 0.01 to <0.1 μm in thickness. <P>COPYRIGHT: (C)2008,JPO&INPIT |
