发明名称 SURFACE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface processing method for improving heat transmission efficiency with a substrate by making a surface of an electrostatic chuck to be smooth. SOLUTION: A substrate processor is provided with a chamber storing a wafer. A susceptor as a mounting stand on which the wafer is mounted is arranged in the chamber. The electrostatic chuck 42 is arranged on the susceptor. In the electrostatic chuck 42, a sprayed coating 1 is formed on the surface. A grinding stone 2 made into a disk shape by hardening abrasive grains is brought into contact with the coating so as to cut the surface. A lap plate 3 is sprayed on the surface with suspension as a mixture of the abrasive grains and lubricant, and brought into contact with the surface. Thus, the surface is cut to be flat. A tape 5 of the tape lap device 4 having the tape 5 to which the abrasive grains 9 are applied and fixed, and a roller 6 formed of an elastic body is brought into contact with the tape lap device 4 by adding pressure to the tape lap device 4 so as to cut the surface to be smooth. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007258240(A) 申请公布日期 2007.10.04
申请号 JP20060077266 申请日期 2006.03.20
申请人 TOKYO ELECTRON LTD 发明人 SASAKI YASUHARU;HIGUMA MASAICHI;AOTO MASA;KIKUCHI EIICHIRO
分类号 H01L21/683;B24B1/00;H02N13/00 主分类号 H01L21/683
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