| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspection technology capable of performing defect detection with high sensitivity at a high speed that uses an electron beam. SOLUTION: This device is equipped with an electron beam irradiation optical system for forming an electron beam emitted from an electron source 1 as an area beam, and irradiating the area beam on the sample 11 surface; a mirror electronic imaging optical system for imaging mirror electrons reflected from the sample 11, to which a negative electric potential is applied by irradiation of the area beam; a stage mechanism system 15, 18, 20 for rotating and moving the sample 11; an image detection system for acquiring images, by detecting the imaged mirror electrons by a TDI sensor or a CCD camera 14, applying image processing thereto, and detecting defects on the sample surface; and a control system for making the stage mechanism system synchronize with the image detection system and controlling them. COPYRIGHT: (C)2008,JPO&INPIT
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