| 发明名称 |
IODATE-CONTAINING CHEMICAL-MECHANICAL POLISHING COMPOSITIONS AND METHODS |
| 摘要 |
<p>The invention provides compositions and methods for planarizing or polishing a substrate. The composition comprises an abrasive, iodate ion, a nitrogen-containing compound selected from the group consisting of a nitrogen-containing C<SUB>4-20</SUB> heterocycle and a C<SUB>1-20</SUB> alkylamine, and a liquid carrier comprising water.</p> |
| 申请公布号 |
WO2007111813(A2) |
申请公布日期 |
2007.10.04 |
| 申请号 |
WO2007US05722 |
申请日期 |
2007.03.06 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
LI, SHOUTIAN;CARTER, PHILLIP;ZHANG, JIAN |
| 分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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