| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist material which is used as a chemically amplified positive resist material and has high resolution and excellent adhesiveness with a substrate and giving a pattern with low roughness on a side wall after development. <P>SOLUTION: The resist material comprises: (A) a polymer compound containing a repeating unit having a group which reacts with an acid to produce a polar group soluble with an alkali developer, a repeating unit produced by cyclization polymerization of fluorine-containing dienes expressed by formula (1):CF<SB>2</SB>=CFCF<SB>2</SB>C(CF<SB>3</SB>)(OH)CH<SB>2</SB>CH=CH<SB>2</SB>and/or formula (2):CF<SB>2</SB>=CFCH<SB>2</SB>CH(C(CF<SB>3</SB>)<SB>2</SB>OH)CH<SB>2</SB>CH=CH<SB>2</SB>, and a repeating unit based on a monomer selected from monomers expressed by formulae (3) to (7); (B) an acid generating compound; and (C) an organic solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT |
