| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion beam processing apparatus capable of exactly processing a workpiece to be exposed by clarifying the details of an ion beams to be emitted, and to provide an operating method thereof. SOLUTION: The processing apparatus has a beam generating section 3 for generating an ion beam; a probe 6 for measuring the number of ions in the ion beam; a first scanning means for allowing the probe to scan in one direction in a plane orthogonal to the ion beam; a second scanning means for allowing the probe to scan in a direction orthogonal to the one direction; and an operating means 2 for performing operation on the basis of a result of scanning and measurement by the probe. In the probe, all of end edges of a scanning side are configured of straight lines, and the operating means is configured so as to calculate the ion beam width of the one direction on at least an exposure surface of a workpiece W to be exposed and the distribution of the number of ion beams in the one direction. COPYRIGHT: (C)2008,JPO&INPIT
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