发明名称 INTERSPINOUS PROCESS SPACER
摘要 An interspinous process spacer (100) is generally rectangular and may have an upper face (106) that generally opposes a lower face (105), front and back sides (104,103) that generally oppose each other, an end side, and a nose (110) that generally opposes the end side. The spacer preferably has rounded edges between the upper face and the front, end, and back sides and between the lower face and the front, end, and back sides. The nose of the spacer is preferably asymmetrical and tapers integrally, distally, and inwardly from the first and second faces to form a generally pointed or rounded distal tip. A spacer may be inserted laterally into the interspinous space through a small, posterior midline incision, allowing the preservation of the supraspinous ligament.
申请公布号 WO2007089905(A3) 申请公布日期 2007.10.04
申请号 WO2007US02791 申请日期 2007.01.31
申请人 SYNTHES (U.S.A.);SYNTHES GMBH;JACKSON, BENJAMIN, L.;CHOW, DAVID;DELURIO, ROBERT, J. 发明人 JACKSON, BENJAMIN, L.;CHOW, DAVID;DELURIO, ROBERT, J.
分类号 A61B17/70;A61F2/44 主分类号 A61B17/70
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