发明名称 HIGH-CLEANING, LOW ABRASION, HIGH BRIGHTNESS SILICA MATERIALS FOR DENTRIFICES
摘要 Unique abrasive materials that are in situ generated compositions of prec ipitated silicas and silica gels are provided. Such compositions exhibit dif ferent beneficial, particularly simultaneously high pellicle film cleaning p roperties and moderate dentin abrasion levels. Such a result thus accords th e user a dentifrice that effectively cleans tooth surfaces without detriment ally abrading such surfaces. Furthermore, the produced abrasive materials al so exhibit very high and desirable brightness properties that permit easy in corporation and utilization within dentifrices for aesthetic purposes. Encom passed within this invention is a unique method for making such gel/precipit ated silica composite materials for such a purpose, particularly under high shear conditions, as well as the different materials within the structure ra nges described above and dentifrices comprising such.
申请公布号 CA2666244(A1) 申请公布日期 2007.10.04
申请号 CA20072666244 申请日期 2007.03.20
申请人 J.M. HUBER CORPORATION;MCGILL, PATRICK D. 发明人 MCGILL, PATRICK D.
分类号 A61K8/25;A61Q11/00 主分类号 A61K8/25
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