| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus wherein it is unnecessary to operate a scanning-directional-light shading member independently in response to the scanning operation of a reticle stage, with respect to the exposure apparatus used in the lithography of a semiconductor integrated circuit, etc. <P>SOLUTION: In the exposure apparatus, the reticle stage for disposing thereon a reticle and the sensitive-substrate stage for disposing thereon a sensitive substrate are scanned synchronously to transcribe on the sensitive substrate the reticle pattern depicted by the exposure light reflected from the reticle. In this exposure apparatus, a scanning-directional-light shading member for restricting the exposure reticle region present in the scanning direction is disposed on the reticle stage movably together with the reticle stage. Alternatively, the scanning-directional-light shading member is disposed movably relatively to the reticle stage. <P>COPYRIGHT: (C)2008,JPO&INPIT |
