发明名称 |
Liquid processing apparatus and liquid processing method |
摘要 |
A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal state, a rotation mechanism configured to rotate the substrate holding member, and a liquid supply mechanism configured to supply the process liquid onto a surface of the substrate. The liquid supply mechanism includes first and second liquid delivery nozzles configured to deliver the same process liquid. The first liquid delivery nozzle has a smaller diameter and provides a smaller delivery flow rate, as compared to the second liquid delivery nozzle. The first liquid delivery nozzle is inclined to deliver the process liquid in a rotational direction of the substrate, and is movable between a center of the substrate and a peripheral edge thereof.
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申请公布号 |
US2007231483(A1) |
申请公布日期 |
2007.10.04 |
申请号 |
US20070727656 |
申请日期 |
2007.03.27 |
申请人 |
NANBA HIROMITSU;YOSHIDA MASAHIRO;MURAKAMI YUJI;NAGAYASU HIROSHI |
发明人 |
NANBA HIROMITSU;YOSHIDA MASAHIRO;MURAKAMI YUJI;NAGAYASU HIROSHI |
分类号 |
B05D3/12;B05B3/00;B05C11/02 |
主分类号 |
B05D3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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