MOLECULAR RESIN, PHOTORESIST COMPOSITION INCLUDING THE MOLECULAR RESIN AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION

摘要

A molecular resin for photoresist, a photoresist composition containing the molecular resin, and a method for forming a pattern by using the composition are provided to improve etching resistance of a photoresist pattern and uniformity of pattern profile. A molecular resin comprises a beta-cyclodextrin derivative having the structure of beta-cyclodextrin combined with a t-butoxycarbonate group. Preferably the beta-cyclodextrin derivative is represented by the formula 1. The photoresist composition comprises 7-14 wt% of the molecular resin; 0.1-0.5 wt% of a photoacid generator; and the balance of an organic solvent.