| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask blank having a multilayered film which is less damaged when wet-etched and can easily be etched, and a gradation mask. <P>SOLUTION: The mask blank has a transparent substrate 11 and the multilayered film 15 (12, 13) which is formed on the transparent substrate by layering at least a film made of metal or metal compound capable of being wet-etched, in at least two layers, the mask blank being characterized in that films of two layers which are in contact in the multilayered film can be wet-etched using the same etchant and the upper-layer film is electrochemically base as compared with the lower-layer film. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
