ARCHITECTURE FOR RIBBON ION BEAM ION IMPLANTER SYSTEM

摘要

An architecture (100) for a ribbon ion beam ion implanter system (102) is disclosed. In one embodiment, the architecture (100) includes an acceleration/deceleration parallelizing lens system (120) for receiving a fanned ribbon ion beam (124) and for at least parallelizing (and perhaps also accelerate or decelerate) the fanned ribbon ion beam (124) into a substantially parallel ribbon ion beam (112), and an energy filter system (122) downstream from the acceleration/deceleration parallelizing lens system (120) and prior to a work piece (128) to be implanted by the substantially parallel ribbon ion beam. The acceleration/deceleration parallelizing lens system (120) includes lenses (126) for at least parallelizing (and perhaps also accelerate or decelerate) the fanned ribbon ion beam (124) and acceleration/deceleration lenses for accelerating or decelerating the substantially parallel ribbon ion beam (112). The parallelizing lens allows delivery of a high current ribbon ion beam to the work piece (128) with energy that can extend down to as low as approximately 200 eV.