| 摘要 |
The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure (I), where, R' is selected independently from hydrogen, (C<SUB>1</SUB>-C<SUB>4</SUB>)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure (II), where, W is a multivalent linking group, R<SUB>1</SUB> to R<SUB>6</SUB> are independently selected from hydrogen, hydroxyl, (C<SUB>1</SUB>-C<SUB>2O</SUB>) alkyl and chlorine, X<SUB>1</SUB> and X<SUB>2</SUB> are independently oxygen or N-R<SUB>7</SUB>, where R<SUB>7</SUB> is hydrogen or (C<SUB>1</SUB>-C<SUB>2O</SUB>) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition. |
