发明名称 OPHTHALMIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a Shack Hartman wave-front sensor which achieves a fast repeated measurement with a shorter measuring interval. <P>SOLUTION: A lighting optical system 10 comprises a first polarizing optical member 12 for alternately changing polarlization requirements from those for a first polarization to those for the second polarization and lights an eyeground of an eye 100 to be examined with a pulse light from a laser beam source 11 through the first polarizing optical member 12. A photodetecting optical system 20 comprises a second polarizing optical member 23 which selects respective polarizing components of beams of reflected light from the eyes 100 to be examined lighted according to the polarization requirements for the first polarizing optical member 12 and the first and second photodetecting parts 21-1 and 21-2 which alternately receive the beams of reflected light of the respective polarizing components selected alternately. The optometrical apparatus measures the wavefront aberration of the eye 100 to be measured from outputs of the first and second photodetecting parts 21-1 and 21-2 with a short interval. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007252402(A) 申请公布日期 2007.10.04
申请号 JP20060076712 申请日期 2006.03.20
申请人 TOPCON CORP 发明人 KOBAYASHI MARIKO;YAMAGUCHI TATSUO;MIHASHI TOSHIBUMI
分类号 A61B3/10 主分类号 A61B3/10
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