COATING COMPOSITION FOR USE WITH OVERCOATED PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide a coating composition to be used with an overcoated photoresist.

SOLUTION: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or base-reactive groups following crosslinking. In another aspect, the underlying coating composition is provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.

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