| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a defect correction method for a translucent region of a photomask having gradations in which a correction film of high precision and high quality can be formed irrelevantly to the size and shape of a defect part as a defect correcting method for a translucent film of the photomask having the gradations; and the photomask having the gradations. <P>SOLUTION: In the defect correction method for the translucent region of the photomask with the gradations which has a pattern on one main surface of a transparent substrate, the photomask being characterized in that a film forming the pattern comprises a light shield film which does not transmit exposure light and the translucent film which transmits the exposure light with desired transmissivity and the photomask has a light shield region where the light shield film is at least present, a translucent region where the translucent film is present, and a transmission region where neither the light shield film nor the translucent film is present. The defect correction method is characterized in that a translucent film for correction is formed on the other main surface of the transparent substrate opposed to a white defect part of the translucent region in conformity with the shape of the white defect part and the quantity of transmitted light of the translucent film for correction is equalized to that of the normal translucent region including no defect. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
