发明名称 HEAT TREATMENT APPARATUS AND METHOD, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a heat treatment apparatus which can raise/drop temperature at high speed while keeping in-plane temperature constant without influence on the material on the surface of an object to be treated. SOLUTION: The heat treatment apparatus is used to apply specified heat treatment to an object W to be treated. The apparatus includes a processing container 4 to house the object to be treated; a placement table 28 to place the object to be treated, an evacuation system 24 to evacuate the processing container; an electromagnetic wave supply means 56 to irradiate electromagnetic wave for heating to the object to be treated; and a control means 78 to control the means 56 in a manner to irradiate the electromagnetic wave under pressure in high vacuum where no plasma occurs against the object to be treated, or in such condition that the density of electromagnetic wave irradiation energy is made low. Thus, temperature is raised/lowered at high speed while keeping in-plane temperature constant without influence on the material on the surface of the object to be treated. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007258286(A) 申请公布日期 2007.10.04
申请号 JP20060077943 申请日期 2006.03.22
申请人 TOKYO ELECTRON LTD 发明人 SHIMIZU MASAHIRO
分类号 H01L21/268;H01L21/22;H01L21/265;H01L21/318;H05B6/64;H05B6/72 主分类号 H01L21/268
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