发明名称 PROFILE MEASUREMENT DEVICE AND METHOD OF ELECTRON BEAM AND LASER BEAM
摘要 PROBLEM TO BE SOLVED: To provide a profile measurement device and method of an electron beam and a laser beam capable of accurately matching the focus and incident angle of the electron beam with those of the laser beam, of measuring four-dimensional profiles (temporal changes of three-dimensional profiles) of the electron beam and the laser beam, and of thereby remarkably increasing utilization efficiency of the laser beam. SOLUTION: This profile measurement device includes: a profile measurement device 30 for measuring a cross-sectional profile of each beam in the vicinity of a collision position at which the electron beam 1 and the laser beam 3 crash into each other; and a moving device 40 for continuously moving the profile measurement device in a predetermined direction nearly coincident with the axial directions of the respective beams. In addition, the temporal changes of the three-dimensional profiles of the electron beam and the laser beam are formed from the cross-sectional profiles by the profile measurement device, the position thereof in the predetermined direction, and oscillation timing of the beams by a profile formation device 50. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007257986(A) 申请公布日期 2007.10.04
申请号 JP20060080383 申请日期 2006.03.23
申请人 IHI CORP;UNIV OF TOKYO;NATL INST OF RADIOLOGICAL SCIENCES 发明人 ISHIDA ONORI;NOSE HIROYUKI;KANEKO NAMIO;KAMISAKA MITSURU;SAKAMOTO FUMITO;DOBASHI KATSUHIRO
分类号 H05G2/00;G01T1/29;G21K5/04 主分类号 H05G2/00
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