| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical solution supplying apparatus, capable of suppressing the mixing of air bubbles into the discharged chemical solution, and to provide a manufacturing method of a semiconductor device, capable of suppressing the occurrence of patterning failure resulting from the air bubbles mixed into the chemical solution. SOLUTION: A vessel 1, having the chemical solution stored therein, is connected to a filter housing 5 via an introductory pipe 2. A filter 6 is provided on the lower part side of the filter housing 5. The chemical solution is sent out from the vessel 1, to the filter housing 5 by a pump 3. A lyophilic surface 13, having affinity for the chemical solution, is provided on the inner surface of the filter housing 5 above the filter 6. A supplier 9 for supplying the chemical solution to an object via a supply pipe 8, wherein a supply valve 7 for opening/closing the involved passage, is connected to the filter housing 5 below the filter 6. Furthermore, an ejector 12 for externally ejecting the chemical solution is connected to above the filter 6 via an ejection pipe 10, where an ejection valve 11 is interposed for opening/closing the involved passage. COPYRIGHT: (C)2008,JPO&INPIT |
