| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing liquid for lithograph: having basic characteristics, as a washing fluid for lithography, of flexibility such that materials for forming various coatings used for a lithography stage and different uses of cleaning of a plurality of objects to be washed are exhaustively covered, washing capability of washing and removing objects to be washed efficiently in a short time, drying performance for short-time speedy drying, and further no adverse influence of the shape of a remaining film used for subsequent stages; having safety such as no adverse influence on environments and human bodies and a low flashing point; and having various demanded characteristics of being inexpensive and stably supplied. SOLUTION: The washing fluid for lithography containing (A) a glycol-based organic solvent, (B) a lactone-based organic solvent, and (C) at least one kind of organic solvent selected from alkokxy benzene and aromatic alcohols is used. COPYRIGHT: (C)2008,JPO&INPIT |
