发明名称 SAMPLE POSITION ADJUSTING METHOD OF X-RAY DEVICE, AND THE X-RAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for adjusting the position of a sample on an XYZψstage, in an X-ray device that has the sample irradiated with a fine X-ray beam. SOLUTION: The X-ray beam 2' is incident on an XZ surface, and an X-axis is moved to determine the position in the surface of the sample 1 on the basis of X-coordinates X1 and X2 that has diffracted X rays 2a suddenly changed in the intensity. Furthermore, the differenceΔX between the values X'<SB>ob</SB>and X<SB>ob</SB>of the coordinates X read, before and after being rotated about a Z-axis by 180°ψis calculated, and the Z-axis is subjected toΔZ correction, asΔZ=ΔX×tanθ/2 (θ: incident angle). If XY surface is deviated from the sample surface 1a, the position of an X-ray beam is deviated with respect to the X-axis by the rotation around the Z-axis. Since this shift is observed as the differenceΔX of the coordinates read before and after the rotation, this deviation can be corrected. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007255932(A) 申请公布日期 2007.10.04
申请号 JP20060077481 申请日期 2006.03.20
申请人 FUJITSU LTD 发明人 NOMURA KENJI;DOI SHUICHI
分类号 G01N23/207 主分类号 G01N23/207
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