| 摘要 |
The present invention provides a system and method for utilizing optical measurements to determine properties of a material. Ellipsometry is used to measure the polarization state of a light beam reflected from or transmitted through a material. Utilizing ellipsometry, two or more Mueller Matrix elements are determined by variation of the polarization state of the incident light. The angular-dependences of the Mueller matrix elements are plotted in a plane, and the symmetrical relationships between the various Mueller Matrix element distributions are then be determined. Upon determining symmetrical relationships, two and/or three dimensional atomic or molecular arrangements of atoms or molecules in the material are determined. Based on the two or three dimensional atomic or molecular arrangements, a material property, such as chiralty, may be determined.
|
