| 发明名称 |
Imprinting of Partial Fields at the Edge of the Wafer |
| 摘要 |
The present invention is directed towards several aspects of imprint lithography that have to be improved to address imprinting of partial fields and dies at the edge of the wafer.
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| 申请公布号 |
US2007228609(A1) |
申请公布日期 |
2007.10.04 |
| 申请号 |
US20070694500 |
申请日期 |
2007.03.30 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SREENIVASAN SIDLGATA V.;CHOI BYUNG-JIN |
| 分类号 |
B29C43/02 |
主分类号 |
B29C43/02 |
| 代理机构 |
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