发明名称 |
CLEANING SOLUTIONS INCLUDING PRESERVATIVE COMPOUNDS FOR POST CMP CLEANING PROCESSES |
摘要 |
<p>Post CMP cleaning solutions are provided including at least one cleaning agent comprising an organic acid compound, at least one preservative compound that substantially minimizes or prevents microbial growth in the cleaning solution, and at least one amine compound. The preservative compound can be another organic acid compound that protects the cleaning solution against microbial growth. The cleaning solutions preferably have a pH ranging from about 2 to about 7.</p> |
申请公布号 |
WO2007110720(A1) |
申请公布日期 |
2007.10.04 |
申请号 |
WO2007IB00605 |
申请日期 |
2007.03.13 |
申请人 |
L'AIR LIQUIE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PRECEDES GEORGES CLAUDE;FISHER, MATTHEW;MISRA, ASHUTOSH |
发明人 |
FISHER, MATTHEW;MISRA, ASHUTOSH |
分类号 |
C11D3/00;C11D3/20;C11D3/28;C11D3/30;C11D7/26;C11D7/32;C11D11/00 |
主分类号 |
C11D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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