| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-treating device capable of quickly maintaining the treatment chamber for treating substrates. SOLUTION: The substrate-treating device 10 comprises a treatment chamber 78 with an open section 76 formed therein; a lid section 80 for opening/closing the open section 76; and a plasma unit 82 for activating gas supplied to the treatment chamber 78. The plasma unit 82 is fixed to a slide plate 134, slidably supported by a slide guide stand 140 via a fixing plate 128 etc., and can travel between a first position for supplying gas to the treatment chamber 78 and a second position for opening/closing the lid section 80. COPYRIGHT: (C)2008,JPO&INPIT
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