发明名称 Radiation-sensitive negative resin composition
摘要 A process is provided whereby thick platings such as bumps and wirings are produced with high precision while a resist shows high swelling resistance to a plating solution and the plating solution is prevented from leaking in between the pattern and substrate. A radiation-sensitive negative resin composition shows high sensitivity in the production process and possesses excellent resolution and heat resistance. A transfer film includes the composition. The radiation-sensitive negative resin composition includes (A) a polymer including a structural unit represented by Formula (1) and a structural unit represented by Formula (2); (B) a compound having at least one ethylenically unsaturated double bond; and (C) a radiation-sensitive radical polymerization initiator; wherein R<SUP>1 </SUP>is a hydrogen atom or a methyl group; R<SUP>2 </SUP>is a linear, cyclic or aromatic hydrocarbon group of 6 to 12 carbon atoms, or a substituted hydrocarbon group wherein at least one hydrogen atom in the linear, cyclic or aromatic hydrocarbon group is substituted with a hydrocarbon group; R<SUP>3</SUP>is a hydrogen atom or a methyl group; R<SUP>4 </SUP>is -(C<SUB>n</SUB>H<SUB>2n</SUB>)-; m is an integer of 1 to 10; and n is an integer of 2 to 4.
申请公布号 US2007231747(A1) 申请公布日期 2007.10.04
申请号 US20070729940 申请日期 2007.03.30
申请人 JSR CORPORATION 发明人 ONIMARU NAMI;SAKAI HIROKO
分类号 G03C5/00 主分类号 G03C5/00
代理机构 代理人
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