发明名称 Line end spacing measurement
摘要 A method including: providing collinear first and second lines in a mask layer over a substrate, the first line having at one end a first line end and having a first line body adjacent the first line end, and the second line having at one end a second line end and having a second line body adjacent the second line end; measuring line widths of the first line body and the second line body; locating effective line end positions for the first line end based on the line width of the first line body and for the second line end based on the line width of the second line body; and measuring a distance between the effective line end positions, as an effective line end spacing.
申请公布号 US2007228003(A1) 申请公布日期 2007.10.04
申请号 US20060397464 申请日期 2006.04.04
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 HUANG JIANN Y.;CHANG ANDERSON;KE CHIH-MING;LEE H. J.;LIN CHIN-HSIANG;GAU TSAI-SHENG
分类号 C23F1/00;G01L21/30 主分类号 C23F1/00
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