发明名称 |
Polymerisierbare fluorierte Verbindung, Herstellungsverfahren, Polymer, Resistzusammenstellung und Strukturierungsverfahren |
摘要 |
<p>A polymerizable fluorinated compound having formula (2a) or (2b) wherein R 1 and R 2 are H or C 1 -C 20 alkyl or fluoroalkyl, R 3 is H, F or C 1 -C 4 alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength ‰¤ 300 nm, alkali development amenability, and dry etch resistance.</p> |
申请公布号 |
DE602005002110(D1) |
申请公布日期 |
2007.10.04 |
申请号 |
DE20056002110T |
申请日期 |
2005.10.28 |
申请人 |
SHIN-ETSU CHEMICAL CO. LTD. |
发明人 |
HARADA, YUJI;HATAKEYAMA, JUN;WATANABE, TAKERU;KINSHO, TAKESHI |
分类号 |
C07D309/10;C08F20/28;G03F7/004;G03F7/039 |
主分类号 |
C07D309/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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