发明名称 Polymerisierbare fluorierte Verbindung, Herstellungsverfahren, Polymer, Resistzusammenstellung und Strukturierungsverfahren
摘要 <p>A polymerizable fluorinated compound having formula (2a) or (2b) wherein R 1 and R 2 are H or C 1 -C 20 alkyl or fluoroalkyl, R 3 is H, F or C 1 -C 4 alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength ‰¤ 300 nm, alkali development amenability, and dry etch resistance.</p>
申请公布号 DE602005002110(D1) 申请公布日期 2007.10.04
申请号 DE20056002110T 申请日期 2005.10.28
申请人 SHIN-ETSU CHEMICAL CO. LTD. 发明人 HARADA, YUJI;HATAKEYAMA, JUN;WATANABE, TAKERU;KINSHO, TAKESHI
分类号 C07D309/10;C08F20/28;G03F7/004;G03F7/039 主分类号 C07D309/10
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