发明名称 PARTICLE DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a technology to easily and efficiently form conductive portions such as bumps of an electronic component by a method different from screen printing and plating method which have been conventionally used. SOLUTION: This is a method of depositing particles in openings of a resist by dipping a substrate coated with the resist having the openings in a suspension wherein the particles are dispersed. The suspension has such a viscosity as to let the dispersed particles settle and deposit in the openings. This particle deposition method dips the substrate in the suspension, and lets the particles deposit in the openings. By this method, the particles can be evenly deposited in the openings of the substrate in a relatively short time. Furthermore, since excessive particles remaining on the resist can be easily removed, the conductors such as bumps having a desired shape can be formed in the electronic component. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007258409(A) 申请公布日期 2007.10.04
申请号 JP20060080205 申请日期 2006.03.23
申请人 ELECTROPLATING ENG OF JAPAN CO 发明人 ITABASHI KAZUMITSU
分类号 H05K3/18;G03F7/40;H01L21/027;H01L21/288 主分类号 H05K3/18
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