发明名称 SURFACE INSPECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide surface inspection apparatus with functionality to easily can observe and track condition of defective wafer end throughout process. SOLUTION: A wafer surface inspection apparatus for inspecting wafer circumference comprises lens system and CCD camera to photograph the image of the wafer circumference, a memory means for storing the photographed image data, and display means for displaying the image data stored in a memory device. Furthermore, more specifically, it also is characterized by own functionality that it is put on pre-alignment section to turn wafer, uses lens system and CCD camera to record images of corresponding to a full circumference around the wafer edge in the area for performing alignment of orientation flat section or notch section of wafer, and saves these images in a memory device, to be displayed on CRT. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007256272(A) 申请公布日期 2007.10.04
申请号 JP20070042241 申请日期 2007.02.22
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 AZUMA YASUSHI;WATANABE TETSUYA;AIKO KENJI
分类号 G01N21/956;G01B11/30;G01N21/88;H01L21/66 主分类号 G01N21/956
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