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发明名称
METHOD FOR PREPARING HIGH PURITY RUTHENIUM SPUTTERING TARGET
摘要
申请公布号
EP1026283(B1)
申请公布日期
2007.10.03
申请号
EP19990929828
申请日期
1999.07.14
申请人
NIPPON MINING & METALS CO., LTD.
发明人
SHINDO, YUICHIRO;SUZUKI, TSUNEO
分类号
C01G55/00;C23C14/34;B22F1/00;B22F3/00;B22F3/14;B22F9/22;C22B11/00;C22B61/00;C22C1/04;C22C5/04;H01L21/285
主分类号
C01G55/00
代理机构
代理人
主权项
地址
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