发明名称 |
METHOD FOR PREPARING A CERIUM OXIDE POWDER FOR A CHEMICAL MECHANICAL POLISHING SLURRY |
摘要 |
The present invention relates to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same, and more particularly, to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same in which the specific surface area of the powder is increased by preparing a cerium precursor, and then decomposing and calcinating the prepared cerium precursor. The pore distribution is controlled to increase the chemical contact area between a polished film and a polishing material, thereby reducing polishing time while the physical strength of powder is decreased, which remarkably reduces scratches on a polished film. |
申请公布号 |
EP1838620(A1) |
申请公布日期 |
2007.10.03 |
申请号 |
EP20060799187 |
申请日期 |
2006.10.12 |
申请人 |
LG CHEMICAL CO. LTD |
发明人 |
OH, Myoung-hwan;NHO, Jun-seok;KIM, Jang-yul;KIM, Jong-pil;CHO, Seung-beom;KO, Min-Jin |
分类号 |
C01F17/00;C09G1/02;C09K3/14 |
主分类号 |
C01F17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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