发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR CHIPS AND SEMICONDUCTOR WAFER
摘要 In a semiconductor wafer that has semiconductor devices arranged in a plurality of device-formation-regions and a TEG placed in dividing regions that define the device-formation-regions, a TEG-placement portion is arranged in the dividing regions partially expanded in width, and the TEG is placed in the TEG-placement portion. Additionally, a protective sheet is stuck to the semiconductor wafer, then plasma etching is performed, and the TEG is removed in a state where it remains in the dividing region and stuck to the protective sheet together with the protective sheet by peeling off the protective sheet, thereby the device-formation-regions are divided into individual pieces, and the semiconductor chips are manufactured.
申请公布号 EP1839333(A2) 申请公布日期 2007.10.03
申请号 EP20060711691 申请日期 2006.01.10
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 ARITA, KIYOSHI;NISHINAKA, TERUAKI
分类号 H01L21/78;H01L21/68;H01L23/544 主分类号 H01L21/78
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