A method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus

摘要

A method for preventing or reducing contamination of an immersion type projection apparatus is disclosed. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.