| 摘要 |
<p>A resist composition, and a method for forming a pattern by using the composition are provided to improve resolution, line edge roughness and side rob margin. A resist composition comprises at least one nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group and an ammonium salt compound having a phenoxy group. Preferably the nitrogen-containing compound has at least one oxyalkylene group between a phenoxy group and a nitrogen atom. Preferably the resist composition comprises at least one nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group and an ammonium salt compound having a phenoxy group; a compound whose solubility increases in an alkali developer under the action of an acid; and a compound generating an acid under the irradiation of active rays or radioactive rays.</p> |
