METHOD OF FORMING CARBON POLYMER FILM USING PLASMA CHEMICAL VAPOR DEPOSITION

摘要

A method for forming a carbon polymer film using plasma chemical vapor deposition is provided to reduce an extinction of coefficient of a hydrocarbon-containing polymer film by 193nm, thereby increasing mechanical hardness thereof. A hydrocarbon-containing liquid monomer having a boiling point of 20°C to 350°C which is not substituted by a vinyl group or an acetylene group is vaporized. The vaporized gas and CO2 gas or H2 gas are introduced into a chemical vapor deposition reaction chamber(11) in which a substrate(1) is located. A hydrocarbon-containing polymer film is formed on the substrate by plasma polymerization of the gas. A flow rate of the CO2 gas or H2 gas is controlled so that the film has an extinction coefficient of up to 0.38 at 193nm and a mechanical hardness of 0.5GPa or more.