| 摘要 |
A line-width measurement adjusting method and a scanning electron microscope are provided to avoid a measured result difference by adjusting electron beam intensity distributions. A scanning electron microscope(100) includes an electron scanning unit(10), a signal processing unit(30), an image display unit(40), and a control unit(20) for controlling each part of the electron scanning unit, the signal processing unit, and the image display unit. The electron scanning unit includes an electron gun(1), a condenser lens(2), a deflection coil(3), an object lens(4), a moving stage(5), and a sample holder(6). Electrically charged particles(9) are irradiated from the electron gun onto a sample(7) on the moving stag through the condenser lens, the deflection coil, and the object lens. An electron detector(8) including a scintillator is formed to detect the amount of secondary electrons or reflected electrons.
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