| 摘要 |
An apparatus for manufacturing copper oxide nanorods and nanoparticles is provided to produce copper oxide nanorods and nanoparticles in a simple and easy method. An apparatus for manufacturing copper oxide nanorods and nanoparticles includes: a sputtering device which mounts a copper substrate in a vacuum chamber, ionizes an argon-oxygen mixture gas to form argon-oxygen plasma, and makes the argon-oxygen plasma collide with the copper substrate to make cupper oxide nanoparticles and nanorods; a device for controlling the flux and pressure of argon-oxygen mixture gas in the sputtering device; a device for controlling the temperature, position, argon-oxygen mixture gas-colliding angle of the copper substrate; and a hot-wire and liquid nitrogen supply device which heats or cools the copper substrate, or maintains temperature of the copper substrate. |
