发明名称 System and method for electron-beam lithography
摘要 To achieve high-resolution lithography, the temperature of a sample is controlled with heater wires during electron-beam lithography, the adverse effect of a magnetic field induced by the heater current is suppressed. Namely, heater wires are used to control the temperature of a sample so that the temperature will be maintained constant. In order to minimize the adverse effect of a magnetic field during the passage of currents through the heater wires, two heater wires are layered with the arrangement of the upper and lower sides, currents are fed to flow through the heater wires in mutually opposite directions, and the ratio of the current flowing through the upper heater wire to the one flowing through the lower heater wire is slightly changed from zero.
申请公布号 US7276709(B2) 申请公布日期 2007.10.02
申请号 US20050109861 申请日期 2005.04.20
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 FUKUSHIMA YOSHIMASA;TSUJI HIROSHI;TANIMOTO SAYAKA
分类号 H01J37/20;B32B27/04;G01F23/00;H01J37/317;H01L21/00 主分类号 H01J37/20
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