Methods for generating or designing sidelobe inhibitors for radiation patterning tools

摘要

Design methods and a computer-readable medium having computer-executable instructions thereon for sidelobe suppression in a radiation-patterning tool or mask. Sidelobe artifacts are mitigated by identifying elements as a function of the radiation wavelength for forming desired profiles on a semiconductor wafer. A diffraction ring is calculated around each of the elements to identify sidelobe interference zones and intesections of diffraction rings are located. When a guard ring around one of the intersections would otherwise overlap with a guard ring around another one of the intersections, a common sidelobe inhibitor is located at the common overlap region of the guard rings. A method for forming a mask with the addition of sidelobe inhibitors as well as a method for determining the location of placement of sidelobe inhibitors is also disclosed.